The effect of Al target current on the structure and properties of (Nb2Al)N films with an amorphous AlN phase

Nanocomposite films based on (Nb2Al)N intermetallic nitride have been obtained by the method of magnetron sputtering. X-ray diffraction analysis revealed two stable states of the crystalline structure: (i) NbN with low amount (within 5 at %) of dissolved Al in a composition close to (Nb 2 Al)N and (...

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Bibliographic Details
Published inTechnical physics letters Vol. 41; no. 7; pp. 697 - 700
Main Authors Ivashchenko, V. I., Pogrebnjak, A. D., Sobol’, O. V., Rogoz, V. N., Meilekhov, A. A., Dub, S. N., Kupchishin, A. I.
Format Journal Article
LanguageEnglish
Published Moscow Pleiades Publishing 01.07.2015
Subjects
Classical and Continuum Physics
Physics
Physics and Astronomy
Knoop Hardness
Nanocomposite Film
Technical Physic Letter
Aluminum Nitride
Substructural Characteristic
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Summary:Nanocomposite films based on (Nb2Al)N intermetallic nitride have been obtained by the method of magnetron sputtering. X-ray diffraction analysis revealed two stable states of the crystalline structure: (i) NbN with low amount (within 5 at %) of dissolved Al in a composition close to (Nb 2 Al)N and (ii) an amorphous component related to aluminum nitride formed by reactive magnetron sputtering. The substructural characteristics (grain size and microdeformation level) are sensitive to the current via Al target and exhibit correlation with nanohardness and Knoop hardness of the film, which vary within 29–33.5 and 46–48 GPa, respectively.
ISSN:1063-7850
1090-6533
DOI:10.1134/S1063785015070214