Changes of the TiO2 thin film electro-optical properties in the Ar and N2 glow discharge plasma due to effects of the electric field in plasma's sheath

Titanium dioxide thin films were prepared on glass substrates by spin-coating sol-gel method. The samples were exposed to the N2 and Ar glow discharge plasmas. The properties of the crystal structure and electro-optical features were measured. The average crystallite size of the thin films was decre...

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Bibliographic Details
Published inPhysica. B, Condensed matter Vol. 612; p. 412820
Main Authors Amini, A., Zakerhamidi, M.S., Khorram, S.
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 01.07.2021
Elsevier BV
Subjects
Argon plasma
Charge distribution
Chemical bonds
Crystal structure
Crystallites
Electric fields
Glass substrates
Glow discharge plasma
Glow discharges
Nitrogen plasma
Optical properties
Plasma
Plasma physics
Plasmas (physics)
Sheaths
Single-oscillator parameter
Sol-gel
Sol-gel processes
Spin coating
Studies
Thin films
Titanium
Titanium dioxide
XRD
Glow discharge plasma
XRD
Titanium dioxide
Sol-gel
Single-oscillator parameter
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Summary:Titanium dioxide thin films were prepared on glass substrates by spin-coating sol-gel method. The samples were exposed to the N2 and Ar glow discharge plasmas. The properties of the crystal structure and electro-optical features were measured. The average crystallite size of the thin films was decreased at 30% and 41% by the plasma of N2 and Ar, respectively. We showed the changes in the charge distribution of the crystal unit cells and the chemical bonds’ characteristics that lead to alteration of the single-oscillator parameters. Due to the N2 and Ar plasmas, the third-order nonlinear susceptibility in long-wavelength was increased about 25% and 123%, respectively. An alteration occurred in the optical band gap through TiN formation on the surface of the TiO2 thin film in the N2 plasma. This empirical study illustrated more considerable changes in TiO2/Ar thin film, due to the stronger electric field in the sheath of Ar plasma. •N2 and Ar plasma change the structural parameter of TiO2 thin film•N2 and Ar plasma change the optical properties of TiO2 thin film•Each of the electric fields in the N2 and Ar plasma sheath differently affects the obtained properties
ISSN:0921-4526
1873-2135
DOI:10.1016/j.physb.2021.412820