Fast atom diffraction at metal surface
Fast atoms with energies from 300 eV up to 1.7 keV are scattered under a grazing angle of incidence from a clean and flat Ni(1 1 0) surface. For scattering under ”axial surface channeling” conditions, we observe – as reported recently for insulator and semiconductor surfaces – defined diffraction pa...
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Published in | Surface science Vol. 603; no. 3; pp. L23 - L26 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Kidlington
Elsevier B.V
01.02.2009
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | Fast atoms with energies from 300
eV up to 1.7
keV are scattered under a grazing angle of incidence from a clean and flat Ni(1
1
0) surface. For scattering under ”axial surface channeling” conditions, we observe – as reported recently for insulator and semiconductor surfaces – defined diffraction patterns in the angular intensity distributions for scattered fast
3He and
4He atoms. We have investigated the domain of scattering conditions where decoherence phenomena are sufficiently small in order to observe for metal targets quantum scattering of fast atomic projectiles. As a consequence, fast atom diffraction appears to be a general technique with a wide range of applicability in surface science. |
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ISSN: | 0039-6028 1879-2758 |
DOI: | 10.1016/j.susc.2008.12.021 |