Metal layer mask patterning by force microscopy lithography

• Published in: Materials science & engineering. B, Solid-state materials for advanced technology Vol. 112; no. 2; pp. 194 - 199
• Main Authors: Filho, H.D. Fonseca, Maurício, M.H.P., Ponciano, C.R., Prioli, R.
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 25.09.2004
• Subjects: Atomic force microscopy; Masking in lithography; Nano-lithography; Nano-structures; 81.16.-Rf; Atomic force microscopy; 68.37.Ps; 42.82.Cr; 81.16.Nd; Nano-structures; Masking in lithography; Nano-lithography
• ISSN: 0921-5107; 1873-4944
• DOI: 10.1016/j.mseb.2004.05.031

The nano-lithography of a metallic surface in air by atomic force microscopy while operated in contact mode and equipped with a diamond tip is presented. The aluminum mask was prepared by thermal deposition on arsenic sulfide films. The analysis of the scratches performed by the tip on the metallic mask show that the depth of the lithographed pattern increases with the increase of the applied normal force. The scanning velocity is also shown to influence the AFM patterning process. As the scanning velocity increases, the scratch depth and width decreases. Nano-indentations performed with the diamond tip show that the plastically deformed surface increases with the increase of the duration of the applied force. The use of the nano-lithography method to create nano-structures is discussed.