Flexible Carbon-rich Al2O3 Interlayers for Moisture Barrier Films by a Spatially-Resolved Atomic Layer Deposition Process
In this study, we developed effective carbon-rich Al 2 O 3 interlayers for flexible moisture barrier films. The carbon-rich Al 2 O 3 films were deposited with excessive supply of trimethylaluminum (TMA) precursor. The five-layer structure was made with alternate layers of low-carbon Al 2 O 3 and car...
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| Published in | Journal of the Korean Physical Society Vol. 73; no. 1; pp. 40 - 44 |
|---|---|
| Main Authors | , , , , , |
| Format | Journal Article |
| Language | English |
| Published |
Seoul
The Korean Physical Society
01.07.2018
Springer Nature B.V 한국물리학회 |
| Subjects | |
| Online Access | Get full text |
| ISSN | 0374-4884 1976-8524 |
| DOI | 10.3938/jkps.73.40 |
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| Abstract | In this study, we developed effective carbon-rich Al
2
O
3
interlayers for flexible moisture barrier films. The carbon-rich Al
2
O
3
films were deposited with excessive supply of trimethylaluminum (TMA) precursor. The five-layer structure was made with alternate layers of low-carbon Al
2
O
3
and carbon-rich Al
2
O
3
and the water vapor transmission rate (WVTR) of 3.3 × 10
−4
g/(m
2
·day) was demonstrated. The WVTR of the multilayer films is reduced by 36% compared to 25 nm thick single Al
2
O
3
barrier film. The WVTR of the five-layer film shows increase of 86% after 1,000 bending at a 1.5 cm radius, while single Al
2
O
3
thin films increased by 367%. |
|---|---|
| AbstractList | In this study, we developed effective carbon-rich Al
2
O
3
interlayers for flexible moisture barrier films. The carbon-rich Al
2
O
3
films were deposited with excessive supply of trimethylaluminum (TMA) precursor. The five-layer structure was made with alternate layers of low-carbon Al
2
O
3
and carbon-rich Al
2
O
3
and the water vapor transmission rate (WVTR) of 3.3 × 10
−4
g/(m
2
·day) was demonstrated. The WVTR of the multilayer films is reduced by 36% compared to 25 nm thick single Al
2
O
3
barrier film. The WVTR of the five-layer film shows increase of 86% after 1,000 bending at a 1.5 cm radius, while single Al
2
O
3
thin films increased by 367%. In this study, we developed effective carbon-rich Al2O3 interlayers for flexible moisture barrier films. The carbon-rich Al2O3 films were deposited with excessive supply of trimethylaluminum (TMA) precursor. The five-layer structure was made with alternate layers of low-carbon Al2O3 and carbon-rich Al2O3 and the water vapor transmission rate (WVTR) of 3.3 × 10 −4 g/(m2·day) was demonstrated. The WVTR of the multilayer films is reduced by 36% compared to 25 nm thick single Al2O3 barrier film. The WVTR of the five-layer film shows increase of 86% after 1,000 bending at a 1.5 cm radius, while single Al2O3 thin films increased by 367%. KCI Citation Count: 3 In this study, we developed effective carbon-rich Al2O3 interlayers for flexible moisture barrier films. The carbon-rich Al2O3 films were deposited with excessive supply of trimethylaluminum (TMA) precursor. The five-layer structure was made with alternate layers of low-carbon Al2O3 and carbon-rich Al2O3 and the water vapor transmission rate (WVTR) of 3.3 × 10 −4 g/(m2·day) was demonstrated. The WVTR of the multilayer films is reduced by 36% compared to 25 nm thick single Al2O3 barrier film. The WVTR of the five-layer film shows increase of 86% after 1,000 bending at a 1.5 cm radius, while single Al2O3 thin films increased by 367%. |
| Author | Kim, Sun Jung Park, Jang Soon Chae, Heeyeop Cho, Sung Min Ahn, Hyung June Yong, Sang Heon |
| Author_xml | – sequence: 1 givenname: Sang Heon surname: Yong fullname: Yong, Sang Heon organization: School of Chemical Engineering, Sungkyunkwan University (SKKU) – sequence: 2 givenname: Sun Jung surname: Kim fullname: Kim, Sun Jung organization: School of Chemical Engineering, Sungkyunkwan University (SKKU) – sequence: 3 givenname: Jang Soon surname: Park fullname: Park, Jang Soon organization: School of Chemical Engineering, Sungkyunkwan University (SKKU) – sequence: 4 givenname: Sung Min surname: Cho fullname: Cho, Sung Min organization: School of Chemical Engineering, Sungkyunkwan University (SKKU) – sequence: 5 givenname: Hyung June surname: Ahn fullname: Ahn, Hyung June organization: SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU) – sequence: 6 givenname: Heeyeop surname: Chae fullname: Chae, Heeyeop email: hchae@skku.edu organization: School of Chemical Engineering, Sungkyunkwan University (SKKU), SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU) |
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| Cites_doi | 10.1002/ppap.201500096 10.1016/j.orgel.2009.07.015 10.1109/JSTQE.2004.824072 10.1016/S0008-6223(01)00155-5 10.1186/s11671-015-0857-8 10.1088/0268-1242/26/3/034001 10.1016/j.tsf.2012.07.017 10.1021/am500288q 10.1116/1.4914079 10.1016/j.orgel.2012.07.007 10.1021/acsami.6b13380 10.1021/cm0304546 10.1186/s11671-015-0838-y 10.1002/adem.201600819 10.1021/jp7117218 10.1016/j.orgel.2013.09.045 10.1021/jp406738h 10.1016/j.tsf.2013.10.148 10.1021/jp804413a 10.1186/1556-276X-10-2 10.1116/1.5006781 10.1016/j.mseb.2008.06.009 10.1116/1.4902086 10.1016/j.orgel.2016.03.015 10.1063/1.2221912 10.1116/1.3670745 10.1142/S1793292013500410 10.1116/1.4971173 10.1016/j.vacuum.2014.12.015 10.1038/srep40061 |
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| Keywords | Encapsulation Carbon-rich Al Interlayer Moisture Multilayer Barrier Films Flexible Multilayer Films O |
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| Snippet | In this study, we developed effective carbon-rich Al
2
O
3
interlayers for flexible moisture barrier films. The carbon-rich Al
2
O
3
films were deposited with... In this study, we developed effective carbon-rich Al2O3 interlayers for flexible moisture barrier films. The carbon-rich Al2O3 films were deposited with... |
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| SubjectTerms | Aluminum oxide Atomic layer epitaxy Atomic structure Barriers Carbon Interlayers Mathematical and Computational Physics Moisture Multilayers Particle and Nuclear Physics Physics Physics and Astronomy Theoretical Thin films Water vapor 물리학 |
| Title | Flexible Carbon-rich Al2O3 Interlayers for Moisture Barrier Films by a Spatially-Resolved Atomic Layer Deposition Process |
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