Flexible Carbon-rich Al2O3 Interlayers for Moisture Barrier Films by a Spatially-Resolved Atomic Layer Deposition Process

• Published in: Journal of the Korean Physical Society Vol. 73; no. 1; pp. 40 - 44
• Main Authors: Yong, Sang Heon, Kim, Sun Jung, Park, Jang Soon, Cho, Sung Min, Ahn, Hyung June, Chae, Heeyeop
• Format: Journal Article
• Language: English
• Published: Seoul The Korean Physical Society 01.07.2018; Springer Nature B.V; 한국물리학회
• Subjects: Aluminum oxide; Atomic layer epitaxy; Atomic structure; Barriers; Carbon; Interlayers; Mathematical and Computational Physics; Moisture; Multilayers; Particle and Nuclear Physics; Physics; Physics and Astronomy; Theoretical; Thin films; Water vapor; 물리학; Encapsulation; Carbon-rich Al; Interlayer; Moisture Multilayer Barrier Films; Flexible Multilayer Films; O
• ISSN: 0374-4884; 1976-8524
• DOI: 10.3938/jkps.73.40

In this study, we developed effective carbon-rich Al 2 O 3 interlayers for flexible moisture barrier films. The carbon-rich Al 2 O 3 films were deposited with excessive supply of trimethylaluminum (TMA) precursor. The five-layer structure was made with alternate layers of low-carbon Al 2 O 3 and carbon-rich Al 2 O 3 and the water vapor transmission rate (WVTR) of 3.3 × 10 −4 g/(m 2 ·day) was demonstrated. The WVTR of the multilayer films is reduced by 36% compared to 25 nm thick single Al 2 O 3 barrier film. The WVTR of the five-layer film shows increase of 86% after 1,000 bending at a 1.5 cm radius, while single Al 2 O 3 thin films increased by 367%.