Design considerations for a Gaudi test structure which can be used to determine the optimum focus

A test structure is described which can be used to optimize the focus of wafer steppers. Simulation is used to examine the effect that some of the design parameters have on the sensitivity of the structure. Finally some practical measurements are presented.< >

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Bibliographic Details
Published inIEEE transactions on semiconductor manufacturing Vol. 7; no. 3; pp. 272 - 278
Main Authors Fallon, M., Walton, A.J., Stevenson, J.T.M., Ross, A.W.S.
Format Journal Article
LanguageEnglish
Published New York, NY IEEE 01.08.1994
Institute of Electrical and Electronics Engineers
Subjects
Applied sciences
Bars
Electric resistance
Electric variables measurement
Electronics
Exact sciences and technology
Focusing
Image resolution
Instruments
Microelectronic fabrication (materials and surfaces technology)
Optical sensors
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Stimulated emission
Testing
Microelectronic fabrication
Equipment
Electrical properties
Simulation
Focusing
Focus
Structure resolution
Optimal solution
Resistor
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Summary:A test structure is described which can be used to optimize the focus of wafer steppers. Simulation is used to examine the effect that some of the design parameters have on the sensitivity of the structure. Finally some practical measurements are presented.< >
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0894-6507
1558-2345
DOI:10.1109/66.311329