Ordered pattern formation from dewetting of polymer thin film with surface disturbance by capillary force lithography

• Published in: Surface science Vol. 552; no. 1; pp. 139 - 148
• Main Authors: Luo, Chunxia, Xing, Rubo, Han, Yanchun
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 10.03.2004; Amsterdam Elsevier Science; New York, NY
• Subjects: Aromatics; Atomic force microscopy; Capillary waves; Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Physics; Solid-fluid interfaces; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Wetting; Aromatics; Atomic force microscopy; Capillary waves; Wetting; Liquid solid interface; Wafers; Aromatic polymer; Experimental study; Polystyrene; Surface energy; Organic compounds; Dewetting
• ISSN: 0039-6028; 1879-2758
• DOI: 10.1016/j.susc.2004.01.042

The dewetting process of thin polystyrene (PS) film with built-in ordered disturbance by capillary force lithography (CFL) has been investigated in situ by AFM. Two different phenomena are observed depending on the excess surface energy (Δ F γ ) of the system. When Δ F γ is less than a certain critical value (i.e., the disturbance amplitude is under a critical value), the PS film would be flattened and become stable finally by heating above T g. While, if the size of the disturbance amplitude is larger than the critical value, ordered PS liquid droplets form by further dewetting. The pattern formation mechanisms and influencing factors have been discussed in detail.