Contact optical nanolithography using nanoscale C-shaped apertures

C-shaped ridge apertures are used in contact nanolithography to achieve nanometer scale resolution. Lithography results demonstrated that holes as small as 60 nm can be produced in the photoresist by illuminating the apertures with a 355 nm laser beam. Experiments are also performed using comparable...

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Bibliographic Details
Published inOptics express Vol. 14; no. 21; pp. 9902 - 9908
Main Authors Wang, Liang, Jin, Eric X, Uppuluri, Sreemanth M, Xu, Xianfan
Format Journal Article
LanguageEnglish
Published United States 16.10.2006
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Summary:C-shaped ridge apertures are used in contact nanolithography to achieve nanometer scale resolution. Lithography results demonstrated that holes as small as 60 nm can be produced in the photoresist by illuminating the apertures with a 355 nm laser beam. Experiments are also performed using comparable square and rectangular apertures. Results show enhanced transmission and light concentration of C apertures compared to the apertures with regular shapes. Finite difference time domain simulations are used to design the apertures and explain the experimental results.
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ISSN:1094-4087
1094-4087
DOI:10.1364/OE.14.009902