Development of microcrystalline silicon carbide window layers by hot-wire CVD and their applications in microcrystalline silicon thin film solar cells

Microcrystalline silicon carbide (μc-SiC:H) thin films in stoichiometric form were deposited from the gas mixture of monomethylsilane (MMS) and hydrogen by Hot-Wire Chemical Vapor Deposition (HWCVD). These films are highly conductive n-type. The optical gap E 04 is about 3.0–3.2 eV. Such μc-SiC:H wi...

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Bibliographic Details
Published inThin solid films Vol. 519; no. 14; pp. 4523 - 4526
Main Authors Chen, Tao, Huang, Yuelong, Yang, Deren, Carius, Reinhard, Finger, Friedhelm
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 02.05.2011
Elsevier
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Summary:Microcrystalline silicon carbide (μc-SiC:H) thin films in stoichiometric form were deposited from the gas mixture of monomethylsilane (MMS) and hydrogen by Hot-Wire Chemical Vapor Deposition (HWCVD). These films are highly conductive n-type. The optical gap E 04 is about 3.0–3.2 eV. Such μc-SiC:H window layers were successfully applied in n-side illuminated n-i-p microcrystalline silicon thin film solar cells. By increasing the absorber layer thickness from 1 to 2.5 μm, the short circuit current density ( j SC) increases from 23 to 26 mA/cm 2 with Ag back contacts. By applying highly reflective ZnO/Ag back contacts, j SC = 29.6 mA/cm 2 and η = 9.6% were achieved in a cell with a 2-μm-thick absorber layer.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2011.01.299