Development of microcrystalline silicon carbide window layers by hot-wire CVD and their applications in microcrystalline silicon thin film solar cells
Microcrystalline silicon carbide (μc-SiC:H) thin films in stoichiometric form were deposited from the gas mixture of monomethylsilane (MMS) and hydrogen by Hot-Wire Chemical Vapor Deposition (HWCVD). These films are highly conductive n-type. The optical gap E 04 is about 3.0–3.2 eV. Such μc-SiC:H wi...
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Published in | Thin solid films Vol. 519; no. 14; pp. 4523 - 4526 |
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Main Authors | , , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Amsterdam
Elsevier B.V
02.05.2011
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | Microcrystalline silicon carbide (μc-SiC:H) thin films in stoichiometric form were deposited from the gas mixture of monomethylsilane (MMS) and hydrogen by Hot-Wire Chemical Vapor Deposition (HWCVD). These films are highly conductive n-type. The optical gap
E
04 is about 3.0–3.2
eV. Such μc-SiC:H window layers were successfully applied in n-side illuminated n-i-p microcrystalline silicon thin film solar cells. By increasing the absorber layer thickness from 1 to 2.5
μm, the short circuit current density (
j
SC) increases from 23 to 26
mA/cm
2 with Ag back contacts. By applying highly reflective ZnO/Ag back contacts,
j
SC
=
29.6
mA/cm
2 and
η
=
9.6% were achieved in a cell with a 2-μm-thick absorber layer. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2011.01.299 |