Coherent diffractive imaging methods for semiconductor manufacturing

The paradigm shift of the semiconductor industry moving from deep ultraviolet to extreme ultraviolet lithography (EUVL) brought about new challenges in the fabrication of illumination and projection optics, which constitute one of the core sources of cost of ownership for many of the metrology tools...

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Bibliographic Details
Published inAdvanced optical technologies Vol. 6; no. 6; pp. 439 - 448
Main Authors Helfenstein, Patrick, Mochi, Iacopo, Rajeev, Rajendran, Fernandez, Sara, Ekinci, Yasin
Format Journal Article
LanguageEnglish
Published De Gruyter 20.12.2017
Subjects
actinic inspection
coherent diffractive imaging
extreme ultraviolet (EUV)
lensless imaging
mask inspection
ptychography
wafer inspection
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Summary:The paradigm shift of the semiconductor industry moving from deep ultraviolet to extreme ultraviolet lithography (EUVL) brought about new challenges in the fabrication of illumination and projection optics, which constitute one of the core sources of cost of ownership for many of the metrology tools needed in the lithography process. For this reason, lensless imaging techniques based on coherent diffractive imaging started to raise interest in the EUVL community. This paper presents an overview of currently on-going research endeavors that use a number of methods based on lensless imaging with coherent light.
ISSN:2192-8576
2192-8584
DOI:10.1515/aot-2017-0052