Dielectric matrix imposed stress–strain effect on photoluminescence of Ge nanocrystals
Ge nanocrystals embedded in SiO 2 and Lu 2O 3 matrices were fabricated using the pulsed laser deposition method and investigated using high-resolution transmission electron microscopy, X-ray diffractometry and photoluminescence spectroscopy. X-ray diffractometry and Fullprof computer program clearly...
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Published in | Solid state communications Vol. 149; no. 15; pp. 598 - 601 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Kidlington
Elsevier Ltd
01.04.2009
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | Ge nanocrystals embedded in SiO
2 and Lu
2O
3 matrices were fabricated using the pulsed laser deposition method and investigated using high-resolution transmission electron microscopy, X-ray diffractometry and photoluminescence spectroscopy. X-ray diffractometry and Fullprof computer program clearly revealed the bond lengths of Ge nanocrystals embedded in Lu
2O
3 matrix is smaller than that in SiO
2 matrix, which can be attributed to the greater compressive stress exerted on Ge nanocrystals by the Lu
2O
3 matrix. The greater compressive stress will lead to much more defects induced at the interface of Ge nanocrystals and thus enhance the intensity of photoluminescence. The findings presented here indicate that the matrix environment of the nanocrystals plays a significant role in the photoluminescence property. |
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ISSN: | 0038-1098 1879-2766 |
DOI: | 10.1016/j.ssc.2009.01.031 |