Dielectric matrix imposed stress–strain effect on photoluminescence of Ge nanocrystals

Ge nanocrystals embedded in SiO 2 and Lu 2O 3 matrices were fabricated using the pulsed laser deposition method and investigated using high-resolution transmission electron microscopy, X-ray diffractometry and photoluminescence spectroscopy. X-ray diffractometry and Fullprof computer program clearly...

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Bibliographic Details
Published inSolid state communications Vol. 149; no. 15; pp. 598 - 601
Main Authors Wu, R.S., Luo, X.F., Yuan, C.L., Zhang, Z.R.
Format Journal Article
LanguageEnglish
Published Kidlington Elsevier Ltd 01.04.2009
Elsevier
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Summary:Ge nanocrystals embedded in SiO 2 and Lu 2O 3 matrices were fabricated using the pulsed laser deposition method and investigated using high-resolution transmission electron microscopy, X-ray diffractometry and photoluminescence spectroscopy. X-ray diffractometry and Fullprof computer program clearly revealed the bond lengths of Ge nanocrystals embedded in Lu 2O 3 matrix is smaller than that in SiO 2 matrix, which can be attributed to the greater compressive stress exerted on Ge nanocrystals by the Lu 2O 3 matrix. The greater compressive stress will lead to much more defects induced at the interface of Ge nanocrystals and thus enhance the intensity of photoluminescence. The findings presented here indicate that the matrix environment of the nanocrystals plays a significant role in the photoluminescence property.
ISSN:0038-1098
1879-2766
DOI:10.1016/j.ssc.2009.01.031