Atomistic simulation of femtosecond laser pulse interactions with a copper film: Effect of dependency of penetration depth and reflectivity on electron temperature

• Published in: Journal of applied physics Vol. 123; no. 4
• Main Authors: Amouye Foumani, A., Niknam, A. R.
• Format: Journal Article
• Language: English
• Published: Melville American Institute of Physics 28.01.2018
• Subjects: Applied physics; Computer simulation; Copper; Coupling (molecular); Disintegration; Electron energy; Femtosecond pulses; Film thickness; Fluence; Integrals; Metal films; Molecular dynamics; Penetration depth; Reflectance; Temperature; Temperature dependence; Thermal conductivity
• ISSN: 0021-8979; 1089-7550
• DOI: 10.1063/1.5009501

The response of copper films to irradiation with laser pulses of fluences in the range of 100–6000 J/m2 is simulated by using a modified combination of a two-temperature model (TTM) and molecular dynamics (MD). In this model, the dependency of the pulse penetration depth and the reflectivity of the target on electron temperature are taken into account. Also, the temperature-dependent electron-phonon coupling factor, electron thermal conductivity, and electron heat capacity are used in the simulations. Based on this model, the dependence of the integral reflectivity on pulse fluence, the changes in the film thickness, and the evolution of density and electron and lattice temperatures are obtained. Moreover, snapshots that show the melting and disintegration processes are presented. The disintegration starts at a fluence of 4200 J/m2, which corresponds with an absorbed fluence of 616 J/m2. The calculated values of integral reflectivity are in good agreement with the experimental data. The inclusion of such temperature-dependent absorption models in the TTM-MD method would facilitate the comparison of experimental data with simulation results.