Improved stability of titanium based boron-doped chemical vapor deposited diamond thin-film electrode by modifying titanium substrate surface

The film quality and electrochemical properties of BDD (boron-doped diamond) thin films grown by hot-filament chemical vapor deposition technique on titanium substrates that had been subjected to a range of pre-treatment processes were evaluated. The pre-roughened Ti-substrates are shown to support...

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Bibliographic Details
Published inThin solid films Vol. 516; no. 18; pp. 6125 - 6132
Main Authors Lim, P.Y., Lin, F.Y., Shih, H.C., Ralchenko, V.G., Varnin, V.P., Pleskov, Yu.V., Hsu, S.F., Chou, S.S., Hsu, P.L.
Format Journal Article
LanguageEnglish
Russian
Published Lausanne Elsevier B.V 31.07.2008
Elsevier Science
Subjects
Boron
Chemical vapor deposition
Diamond
Electrochemistry
Hydrides
Surface roughness
Titanium
Boron
Electrochemistry
Titanium
Diamond
Hydrides
Surface roughness
Chemical vapor deposition
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Summary:The film quality and electrochemical properties of BDD (boron-doped diamond) thin films grown by hot-filament chemical vapor deposition technique on titanium substrates that had been subjected to a range of pre-treatment processes were evaluated. The pre-roughened Ti-substrates are shown to support more adherent BDD films. It is evident that acid-etching the Ti-substrate involves surface hydrogenation that enhances nucleation and formation of diamond thereon. The prepared BDD film exhibits wide potential window and electrochemical reversibility. It also demonstrated a better long-term electrochemical stability based on the low variation in voltametric background current upon the exposing of the electrodes to repeated cycles of electrochemical metal deposition/stripping process.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2007.11.016