Effect of vacuum level on field emission from nanographite films

The effect of vacuum level on field emission from nanographite films obtained by plasma-chemical deposition is studied. The stable emission of electrons from the nanographite is observed at a threshold field of 1–2 V/μm, a current density of 0.1 mA/cm 2 , and a residual gas pressure in the measuring...

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Bibliographic Details
Published inTechnical physics Vol. 57; no. 7; pp. 1003 - 1007
Main Authors Vasil’eva, E. A., Kleshch, V. I., Obraztsov, A. N.
Format Journal Article
LanguageEnglish
Published Dordrecht SP MAIK Nauka/Interperiodica 01.07.2012
Springer
Subjects
Classical and Continuum Physics
Electron and Ion Emission
Electrons
Physics
Physics and Astronomy
Surface
Interelectrode Spacing
Field Emission Current
Vacuum Level
Field Emission Property
Field Emission
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Summary:The effect of vacuum level on field emission from nanographite films obtained by plasma-chemical deposition is studied. The stable emission of electrons from the nanographite is observed at a threshold field of 1–2 V/μm, a current density of 0.1 mA/cm 2 , and a residual gas pressure in the measuring chamber of less than 10 −5 Torr. At a higher pressure, the emission properties of the films gradually degrade with time. Repeat evacuation of the chamber to 10 −5 Torr restores the emission properties. Such behavior of the nanographite emitters is explained by adsorption/desorption processes (reversible degradation of the emission) and the destruction of the film under the action of residual gas ion bombardment (irreversible changes).
ISSN:1063-7842
1090-6525
DOI:10.1134/S1063784212070237