Vibrational study of silicon oxidation : H2O on Si(100)

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Bibliographic Details
Published inSurface science Vol. 380; no. 2-3; pp. 444 - 454
Main Authors STRUCK, L. M, ENG, J. JR, MANTL, S, BENT, B. E, FLYNN, G. W, CHABAL, Y. J, CHRISTMAN, S. B, CHABAN, E. E, RAGHAVACHARI, K, WILLIAMS, G. P, RADERMACHER, K
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier Science 15.05.1997
Amsterdam
New York, NY
Subjects
Condensed matter: structure, mechanical and thermal properties
Dynamics; vibrations
Exact sciences and technology
Physics
Solid-fluid interfaces
Surface and interface dynamics and vibrations
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Water
Adsorption
Oxidation
Silicon
Infrared spectra
Experimental study
Vibrational mode
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ISSN:0039-6028
1879-2758
DOI:10.1016/S0039-6028(97)00041-1