Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition

• Published in: Journal of materials science & technology Vol. 33; no. 3; pp. 295 - 299
• Main Authors: Yun, Eun-Young, Lee, Woo-Jae, Wang, Qi Min, Kwon, Se-Hun
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01.03.2017
• Subjects: AlN薄膜; Corrosion protection; Plasma-enhanced atomic layer deposition; Ternary transition metal nitrides; TiAlN; Titanium-aluminum nitride; 制备; 原子层沉积; 氮化钛; 等离子体增强; 腐蚀性能; 铝薄膜; Plasma-enhanced atomic layer deposition; Corrosion protection; Ternary transition metal nitrides; Titanium-aluminum nitride
• ISSN: 1005-0302; 1941-1162
• DOI: 10.1016/j.jmst.2016.11.027

Titanium-aluminum-nitride（TiAlN） films were grown by plasma-enhanced atomic layer deposition（PEALD）on 316 L stainless steel at a deposition temperature of 200 °C. A supercycle, consisting of one AlN and ten TiN subcycles, was used to prepare TiAlN films with a chemical composition of Ti（0.25）Al（0.25）N（0.50）. The addition of AlN to TiN resulted in an increased electrical resistivity of TiAlN films of 2800 μΩ cm, compared with 475 μΩ cm of TiN films, mainly due to the high electrical resistivity of AlN and the amorphous structure of TiAlN. However, potentiostatic polarization measurements showed that amorphous TiAlN films exhibited excellent corrosion resistance with a corrosion current density of 0.12 μA/cm~2, about three times higher than that of TiN films, and about 12.5 times higher than that of 316 L stainless steel.