Dependences of Giant Magnetoresistance in Co/Cu Multilayers on Sputtering Conditions

The dependences of magnetoresistance properties in Co/Cu multilayers on sputtering conditions were investigated by measuring the energy distributions of Ar+ ions and metal atoms. It was found that the incident Ar+ ion energy to the substrate increased with decreasing distance D between the target an...

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Published inJapanese Journal of Applied Physics Vol. 45; no. 10S; p. 8466
Main Authors Chen, Changchuan, Suzuki, Yusuke, Kato, Takeshi, Iwata, Satoshi, Tsunashima, Shigeru, Toyoda, Hirotaka, Sugai, Hideo
Format Journal Article
LanguageEnglish
Published 01.10.2006
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Summary:The dependences of magnetoresistance properties in Co/Cu multilayers on sputtering conditions were investigated by measuring the energy distributions of Ar+ ions and metal atoms. It was found that the incident Ar+ ion energy to the substrate increased with decreasing distance D between the target and the substrate. When D was changed from 5 to 11 cm, the interface roughness estimated from low-angle X-ray diffraction was improved and the magnetoresistance ratio at the first peak was increased from 31 to 42% at room temperature. These results suggest that the incident Ar+ energy affects the magnetoresistance through the modification of interface roughness.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.45.8466