Bismuth-Based Pyrochlore Thin Films Deposited at Low Temperatures for Embedded Capacitor Applications

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 45; no. 9S; p. 7325
Main Authors Park, Jong-Hyun, Xian, Cheng-Ji, Seong, Nak-Jin, Yoon, Soon-Gil, Kang, Hyung-Dong, Lee, Jeong-Won, Kim, Woon-Chun, Lim, Sung-Taek, Sohn, Seung-Hyun, Moon, Jin-Seok, Jin, Hyun-Ju, Jung, Hyung-Mi, Lee, Seung-Eun, Chung, Yul-Kyo
Format Journal Article
LanguageEnglish
Published 01.09.2006
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.45.7325