Effects of Thermal Effusivity in Nanocrystalline Porous Silicon on Long-Term Operation of Thermally Induced Ultrasonic Emission

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 46; no. 4S; p. 2599
Main Authors Watabe, Yoshifumi, Honda, Yoshiaki, Koshida, Nobuyoshi
Format Journal Article
LanguageEnglish
Published 01.04.2007
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.46.2599