EASE--An Application-Based CAD System for Process Design

• Published in: IEEE transactions on computer-aided design of integrated circuits and systems Vol. 6; no. 6; pp. 1032 - 1038
• Main Authors: Mar, J., Bhargavan, K., Duvall, S.G., Firestone, R., Lucey, D.J., Nandgaonkar, S.N., Wu, S., Kaung-Shia Yu, Zarbakhsh, F.
• Format: Journal Article
• Language: English
• Published: New York, NY IEEE 01.11.1987; Institute of Electrical and Electronics Engineers
• Subjects: Applied sciences; Computational modeling; Design automation; Electric breakdown; Electronics; Exact sciences and technology; Hardware; Integrated circuits; Parasitic capacitance; Personnel; Predictive models; Process design; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Solid modeling; Integration; Methodology; Electrical properties; Selection; Operating mode; Geometrical configuration; Two dimensional model; Process; Operation study; Input; Microelectronic fabrication; Simulation; Electronic component; Integrated circuit; One dimensional model; Database; Parameter; Software; Reliability; Application; Simplicity; Simulator; Computer aided design; Calculating time
• ISSN: 0278-0070; 1937-4151
• DOI: 10.1109/TCAD.1987.1270344

A new approach for making process and device simulation tools easier to use is presented. Described is an integrated CAD system for process design in which users select applications rather than tools. CAD simulation methodologies for each application are stored in an applications database and supported by automatic execution modules in the system. A database of "seed files" for initial process parameters are also provided. Both execution automation and the content in user interfaces are tailored to the chosen application to provide for an exceptionally simple and efficient interface, one that minimizes user learning requirements.