A model for effect of colloidal forces on chemical mechanical polishing

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Bibliographic Details
Published in	Journal of the Electrochemical Society Vol. 150; no. 4; pp. G233 - G239
Main Authors	MAZAHERI, Ali R, AHMADI, Goodarz
Format	Journal Article
Language	English
Published	Pennington, NJ Electrochemical Society 01.04.2003
Subjects	Cross-disciplinary physics: materials science; rheology Exact sciences and technology Materials science Physics Surface treatments Abrasive wear Mechanical model Digital simulation Semiconductor substrate Electrostatic interaction Theoretical study Van der Waals interaction Surface treatments Chemical mechanical polishing
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ISSN:	0013-4651 1945-7111
DOI:	10.1149/1.1554730