Multilayered Monolithic Silicon Photonic Crystals

In this letter, we describe the fabrication of double-layered self-aligned silicon photonic crystals (PCs) using directional and isotropic etches. The double-layer PCs represent a step towards practical 3-D PCs based on standard Si processing, and they have several advantageous characteristics compa...

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Bibliographic Details
Published inIEEE photonics technology letters Vol. 23; no. 11; pp. 730 - 732
Main Authors Mallick, Shrestha Basu, Il Woong Jung, Meisner, Aaron M, Provine, J, Howe, Roger T, Solgaard, Olav
Format Journal Article
LanguageEnglish
Published New York IEEE 01.06.2011
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subjects
Broadband communication
Broadband mirror
Conferences
Fabrication
Fiber optics
Finite difference method
Lattices
Mathematical analysis
monolithic photonic crystals (PCs)
Optical fibers
photonic crystal (PC) devices
photonic crystal (PC) fabrication
Photonic crystals
Reflectivity
Silicon
silicon photonic crystal (PC) technology
Three dimensional
Three dimensional displays
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Summary:In this letter, we describe the fabrication of double-layered self-aligned silicon photonic crystals (PCs) using directional and isotropic etches. The double-layer PCs represent a step towards practical 3-D PCs based on standard Si processing, and they have several advantageous characteristics compared to single-layer PCs, including higher reflectivity and sharper resonances, as demonstrated both experimentally and by finite-difference time-domain (FDTD) simulations.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Conference-1
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SourceType-Conference Papers & Proceedings-2
ISSN:1041-1135
1941-0174
DOI:10.1109/LPT.2011.2132698