Optimization of thin Si oxynitride films produced by rapid thermal processing for applications in EEPROMs

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Bibliographic Details
Published inJournal of the Electrochemical Society Vol. 140; no. 2; pp. 549 - 555
Main Authors DUTOIT, M, LETOURNEAU, P, MI, J, NOVKOVSKI, N, MANTHEY, J, SOLO DE ZALDIVAR, J
Format Journal Article
LanguageEnglish
Published Pennington, NJ Electrochemical Society 01.02.1993
Subjects
Applied sciences
Electronics
Exact sciences and technology
Integrated circuits
Integrated circuits by function (including memories and processors)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
EEPROM memory
Read only memory(ROM)
Heat treatment
Silicon Oxides
Nitriding
Processing time
Reoxidation
Life test
Optimization
Electrical characteristic
Thin film
Production process
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2221086