Real-time, in situ monitoring of room-temperature silicon surface cleaning using hydrogen and ammonia plasmas
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Published in | Journal of the Electrochemical Society Vol. 140; no. 11; pp. 3316 - 3321 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Pennington, NJ
Electrochemical Society
01.11.1993
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Subjects | |
Online Access | Get full text |
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ISSN: | 0013-4651 1945-7111 |
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DOI: | 10.1149/1.2221029 |