Study of buried interfaces in Fe/Si multilayer by hard x‐ray emission spectroscopy

Hard x‐ray emission spectroscopy (XES) has been used to study buried layers and interfaces in a Fe/Si periodic multilayer. Until now, buried layers could be studied using the XES in the soft x‐ray range. Here, we extend the methodology to study the buried interfaces in hard x‐ray region (photon ener...

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Bibliographic Details
Published inSurface and interface analysis Vol. 53; no. 12; pp. 1043 - 1047
Main Authors Verma, Hina, Le Guen, Karine, Delaunay, Renaud, Ismail, Iyas, Ilakovac, Vita, Rueff, Jean Pascal, Zheng, Yunlin Jacques, Jonnard, Philippe
Format Journal Article
LanguageEnglish
Published Bognor Regis Wiley Subscription Services, Inc 01.12.2021
Wiley-Blackwell
Subjects
buried interfaces
Chemical Physics
Disilicides
Emission analysis
Emission spectroscopy
Intermetallic compounds
Iron silicide
multilayer
Multilayers
Physics
Spectrum analysis
Thickness
x‐ray emission spectroscopy
Multilayer
Buried interfaces
X-ray emission spectroscopy
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Summary:Hard x‐ray emission spectroscopy (XES) has been used to study buried layers and interfaces in a Fe/Si periodic multilayer. Until now, buried layers could be studied using the XES in the soft x‐ray range. Here, we extend the methodology to study the buried interfaces in hard x‐ray region (photon energy ≥ 5 keV). We report the formation of FeSi2 at all the interfaces with thicknesses of 1.4 nm. X‐ray reflectivity measurements enable us to deduce the structure and thickness of the multilayer stack, thereby confirming the presence of FeSi2.
ISSN:0142-2421
1096-9918
DOI:10.1002/sia.7005