Providing of Ultra-Thin Film Thickness Uniformity by Magnetron Sputtering from Two Sources

To achieve high characteristics of single-photon detectors based on WSi thin films it is necessary to provide high film thickness uniformity more than 95%. This paper presents a mathematical modeling of the thickness uniformity of an ultra-thin film formed by magnetron sputtering from two sources, b...

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Bibliographic Details
Published inIOP conference series. Materials Science and Engineering Vol. 781; no. 1; pp. 12012 - 12018
Main Authors Hydyrova, S, Akishin, M Yu, Vasilev, D D, Moiseev, K M
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 01.04.2020
Subjects
Film thickness
Magnetron sputtering
Magnetrons
Mass flow
Nonuniformity
Photovoltaic cells
Substrates
Thin films
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Summary:To achieve high characteristics of single-photon detectors based on WSi thin films it is necessary to provide high film thickness uniformity more than 95%. This paper presents a mathematical modeling of the thickness uniformity of an ultra-thin film formed by magnetron sputtering from two sources, based on an experimentally determined mass flow from a single magnetron, depending on the location of the magnetrons relative to the substrate holder. According to the results of non-uniformity modeling, the requirements for the design and location of the magnetron unit in the chamber were made, which ensured the required non-uniformity of the film thickness of less than 5%.
ISSN:1757-8981
1757-899X
DOI:10.1088/1757-899X/781/1/012012