Ultrathin film deposition for nanoelectronic device manucturing

Study results of thin film with thickness less than 50 nm deposition by means of electron beam evaporation on special vacuum coaters were represented. Calculation results of energy and mass carry magnitude for ITO, Ag and Al thin films deposition with preset of structure and composition homogeneity...

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Bibliographic Details
Published inIOP conference series. Materials Science and Engineering Vol. 781; no. 1; pp. 12021 - 12025
Main Authors Panfilov, Y V, Rodionov, I A, Ryzhikov, I A, Baburin, A S, Moskalev, D O, Lotkov, E S
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 01.04.2020
Subjects
Deposition
Electron beams
Homogeneity
Nanoelectronics
Nanotechnology devices
Thickness
Thin films
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Summary:Study results of thin film with thickness less than 50 nm deposition by means of electron beam evaporation on special vacuum coaters were represented. Calculation results of energy and mass carry magnitude for ITO, Ag and Al thin films deposition with preset of structure and composition homogeneity and roughness were shown.
ISSN:1757-8981
1757-899X
DOI:10.1088/1757-899X/781/1/012021