Band offsets for the epitaxial TiO2/SrTiO3/Si(001) system

We have used x-ray photoelectron spectroscopy with high energy resolution to determine band discontinuities at the two buried interfaces of the epitaxial TiO2 (anatase)/SrTiO3/Si(001) system. The valence band offsets are −2.1±0.1 eV and +0.2±0.1 eV at the SrTiO3/Si and TiO2/SrTiO3 heterojunctions, r...

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Published inApplied physics letters Vol. 83; no. 18; pp. 3734 - 3736
Main Authors Tuan, A. C., Kaspar, T. C., Droubay, T., Rogers, J. W., Chambers, S. A.
Format Journal Article
LanguageEnglish
Published United States 03.11.2003
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Abstract We have used x-ray photoelectron spectroscopy with high energy resolution to determine band discontinuities at the two buried interfaces of the epitaxial TiO2 (anatase)/SrTiO3/Si(001) system. The valence band offsets are −2.1±0.1 eV and +0.2±0.1 eV at the SrTiO3/Si and TiO2/SrTiO3 heterojunctions, respectively. Assuming bulk band gaps for the SrTiO3 and TiO2 epitaxial films, the associated conduction band offsets are +0.1±0.1 eV and +0.1±0.1 eV. Si at the interface is in a flatband state, indicating a very low density of electronic states. These results suggest that spin-polarized electron injection from ferromagnetic Co-doped TiO2 anatase into Si should be facile.
AbstractList We have used x-ray photoelectron spectroscopy with high energy resolution to determine band discontinuities at the two buried interfaces of the epitaxial TiO2 (anatase)/SrTiO3/Si(001) system. The valence band offsets are −2.1±0.1 eV and +0.2±0.1 eV at the SrTiO3/Si and TiO2/SrTiO3 heterojunctions, respectively. Assuming bulk band gaps for the SrTiO3 and TiO2 epitaxial films, the associated conduction band offsets are +0.1±0.1 eV and +0.1±0.1 eV. Si at the interface is in a flatband state, indicating a very low density of electronic states. These results suggest that spin-polarized electron injection from ferromagnetic Co-doped TiO2 anatase into Si should be facile.
We have used x-ray photoelectron spectroscopy with high energy resolution to determine band discontinuities at the two buried interfaces of the epitaxial TiO₂ (anatase)/ SrTiO₃/Si(001) system. The valence band offsets are -2.1 +/- 0.1 eV and +0.2 +/- 0.1 eV at the SrTiO₃/Si and TiO₂/SrTiO₃ heterojunctions, respectively. Assuming bulk band gaps for the SrTiO₃ and TiO₂ epitaxial films, the associated conduction band offsets are +0.1 +/- 0.1 eV and +0.1 +/- 0.1 eV. Si at the interface is in a flat-band state, indicating a very low density of electronic states. These results suggest that spin polarized electron injection from ferromagnetic Co-doped TiO₂ anatase into Si should be facile. PACS numbers: 79.60.Jv, 72.25.Dc
Author Rogers, J. W.
Chambers, S. A.
Droubay, T.
Tuan, A. C.
Kaspar, T. C.
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  givenname: S. A.
  surname: Chambers
  fullname: Chambers, S. A.
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Snippet We have used x-ray photoelectron spectroscopy with high energy resolution to determine band discontinuities at the two buried interfaces of the epitaxial TiO2...
We have used x-ray photoelectron spectroscopy with high energy resolution to determine band discontinuities at the two buried interfaces of the epitaxial TiO₂...
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StartPage 3734
SubjectTerms ENERGY GAP
Environmental Molecular Sciences Laboratory
EPITAXY
INTERFACES
MATERIALS SCIENCE
SILICON
STRONTIUM OXIDES
TITANIUM OXIDES
Title Band offsets for the epitaxial TiO2/SrTiO3/Si(001) system
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