Surface nanostructuring via combined all atmospheric pressure processing, coating, patterning and etching

• Published in: Surface & coatings technology Vol. 205; pp. S567 - S572
• Main Authors: Cook, Ian, Sheel, David W., Hodgkinson, John L.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier B.V 25.07.2011; Elsevier
• Subjects: Applied sciences; Atmospheric pressure; Atmospheric pressure barrier glow discharge; Barometric pressure; Chemical vapor deposition; Coating; Contact angle; Cross-disciplinary physics: materials science; rheology; Etching; Exact sciences and technology; Materials science; Metals. Metallurgy; Nanostructure; Nanostructures; Patterning; Physics; Production techniques; Surface energy; Surface treatment; Surface treatments; Atmospheric pressure barrier glow discharge; Surface energy; Nanostructures; Patterning; Atmospheric pressure; Surface treatments; Coatings; Glow discharges
• ISSN: 0257-8972; 1879-3347
• DOI: 10.1016/j.surfcoat.2011.03.059

Manipulation of surface nanostructure is reported by a sequential multi stage novel combination of all atmospheric pressure based processing. Firstly a thermal chemical vapour deposition (CVD) process is used to deposit a thin zinc oxide film. A flame assisted CVD process is then used to produce the patterning layer. Subsequently an atmospheric pressure dielectric barrier discharge plasma is used to etch the surface to further nanostructure it. We report that this approach can be used to generate a low surface energy organic surface treatment using atmospheric pressure plasma enhanced chemical vapour deposition. The films were characterised by means of atomic force microscopy, transmission spectroscopy, scanning electron microscopy and contact angle.