Characteristics of Planar Junctionless Poly-Si Thin-Film Transistors With Various Channel Thickness
N-type junctionless (JL) planar poly-Si thin-film transistors (TFTs), which contain an in situ heavily phosphorous-doped channel with thickness ranging from 8 to 12 nm, were fabricated and characterized. The devices exhibit superior current drive and good control over performance variability. From C...
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Published in | IEEE transactions on electron devices Vol. 60; no. 3; pp. 1142 - 1148 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
New York, NY
IEEE
01.03.2013
Institute of Electrical and Electronics Engineers The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects | |
Online Access | Get full text |
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Summary: | N-type junctionless (JL) planar poly-Si thin-film transistors (TFTs), which contain an in situ heavily phosphorous-doped channel with thickness ranging from 8 to 12 nm, were fabricated and characterized. The devices exhibit superior current drive and good control over performance variability. From C-V characterization, the ionized dopant concentration in the channel is determined to be around 2 × 10 19 cm -3 and the fixed charge density to be around -6 × 10 12 cm -2 . The negative fixed charge density is probably related to the segregation of phosphorous species at the oxide/channel interface. We also observed a reverse short-channel effect from the relationship between the threshold voltage and the channel length. One mechanism considering enhanced phosphorous segregation is proposed to explain this finding. |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2013.2239647 |