Characteristics of Planar Junctionless Poly-Si Thin-Film Transistors With Various Channel Thickness

N-type junctionless (JL) planar poly-Si thin-film transistors (TFTs), which contain an in situ heavily phosphorous-doped channel with thickness ranging from 8 to 12 nm, were fabricated and characterized. The devices exhibit superior current drive and good control over performance variability. From C...

Full description

Saved in:
Bibliographic Details
Published inIEEE transactions on electron devices Vol. 60; no. 3; pp. 1142 - 1148
Main Authors LIN, Horng-Chih, LIN, Cheng-I, LIN, Zer-Ming, SHIE, Bo-Shiuan, HUANG, Tiao-Yuan
Format Journal Article
LanguageEnglish
Published New York, NY IEEE 01.03.2013
Institute of Electrical and Electronics Engineers
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:N-type junctionless (JL) planar poly-Si thin-film transistors (TFTs), which contain an in situ heavily phosphorous-doped channel with thickness ranging from 8 to 12 nm, were fabricated and characterized. The devices exhibit superior current drive and good control over performance variability. From C-V characterization, the ionized dopant concentration in the channel is determined to be around 2 × 10 19 cm -3 and the fixed charge density to be around -6 × 10 12 cm -2 . The negative fixed charge density is probably related to the segregation of phosphorous species at the oxide/channel interface. We also observed a reverse short-channel effect from the relationship between the threshold voltage and the channel length. One mechanism considering enhanced phosphorous segregation is proposed to explain this finding.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2013.2239647