Selective growth of carbon nanotube on silicon substrates

The carbon nanotube (CNT) growth of iron oxide-deposited trench-patterns and the locally-ordered CNT arrays on silicon substrate were achieved by simple thermal chemical vapor deposition(STCVD) of ethanol vapor. The CNTs were uniformly synthesized with good selectivity on trench-patterned silicon su...

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Published inTransactions of Nonferrous Metals Society of China Vol. 16; no. B01; pp. 377 - 380
Main Author 邹小平 H.ABE T. SHIMIZU A. ANDO H. TOKUMOTO 朱申敏 周豪慎
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 01.06.2006
Nanotechnology Research Center, Research Institute for Electronic Science,Hokkaido University, Sapporo 001-0021, Japan%Energy Electronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibalaki 305-8568, Japan
Nanotechnology Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibalaki 305-8562, Japan
Energy Electronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibalaki 305-8568, Japan%Nanotechnology Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibalaki 305-8562, Japan%Nano-electronics Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibalaki 305-8568, Japan%Nanotechnology Research Institute, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibalaki 305-8562, Japan
Beijing Key Laboratory for Sensor, Beijing 100101, China
Research Center for Sensor Technology, Beijing Information Technology Institute, Beijing 100101, China
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Summary:The carbon nanotube (CNT) growth of iron oxide-deposited trench-patterns and the locally-ordered CNT arrays on silicon substrate were achieved by simple thermal chemical vapor deposition(STCVD) of ethanol vapor. The CNTs were uniformly synthesized with good selectivity on trench-patterned silicon substrates. This fabrication process is compatible with currently used semiconductor-processing technologies, and the carbon-nanotube fabrication process can be widely applied for the development of electronic devices using carbon-nanotube field emitters as cold cathodes and can revolutionize the area of field-emitting electronic devices. The site-selective growth of CNT from an iron oxide nanoparticle catalyst patterned were also achieved by drying-mediated self-assembly technique. The present method offers a simple and cost-effective method to grow carbon nanotubes with self-assembled patterns.
Bibliography:43-1239/TG
carbon nanotubes
trench-patterned
STCVD
locally-ordered pattern
carbon nanotubes; silicon substrate; STCVD; trench-patterned; locally-ordered pattern
TB383
silicon substrate
ISSN:1003-6326
DOI:10.1016/S1003-6326(06)60214-8