Reducing alignment and chromatic sensitivity of holographic optical interconnects with substrate-mode holograms

The alignment and chromatic sensitivity of holographic optical elements for use in optical interconnect systems are quantified. The effects of these image degrading parameters are related to the frequency and power requirements for CMOS compatible detectors in an optical interconnect system. Techniq...

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Bibliographic Details
Published inApplied optics (2004) Vol. 28; no. 22; p. 4939
Main Authors Kostuk, R K, Huang, Y T, Hetherington, D, Kato, M
Format Journal Article
LanguageEnglish
Published United States 15.11.1989
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Summary:The alignment and chromatic sensitivity of holographic optical elements for use in optical interconnect systems are quantified. The effects of these image degrading parameters are related to the frequency and power requirements for CMOS compatible detectors in an optical interconnect system. Techniques for reducing the magnitude of these problems with substrate-mode holograms are described, and experimental results demonstrating these designs are presented.
ISSN:1559-128X
2155-3165
DOI:10.1364/AO.28.004939