A UV curable resin with reworkable properties: application to imprint lithography

Difunctional methacrylate monomers haying a hemiacetal ester moiety in the molecule were used to prepare a plastic replica of an original mold for imprint lithography. UV curing of the monomers was performed with 365 nm light and photo-induced degradation of the cured resins was performed using 254...

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Published inJournal of materials chemistry Vol. 19; no. 24; pp. 4085 - 4087
Main Authors MATSUKAWA, Daisaku, WAKAYAMA, Hiroyuki, MITSUKURA, Kazuyuki, OKAMURA, Haruyuki, HIRAI, Yoshihiko, SHIRAI, Masamitsu
Format Journal Article
LanguageEnglish
Published Cambridge Royal Society of Chemistry 01.01.2009
Subjects
Applied sciences
Electronics
Exact sciences and technology
Materials
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Ester
Microelectronic fabrication
Ultraviolet radiation
Lithography
Curing
Photoinduced effect
Monomer
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Abstract Difunctional methacrylate monomers haying a hemiacetal ester moiety in the molecule were used to prepare a plastic replica of an original mold for imprint lithography. UV curing of the monomers was performed with 365 nm light and photo-induced degradation of the cured resins was performed using 254 nm light.
AbstractList Difunctional methacrylate monomers haying a hemiacetal ester moiety in the molecule were used to prepare a plastic replica of an original mold for imprint lithography. UV curing of the monomers was performed with 365 nm light and photo-induced degradation of the cured resins was performed using 254 nm light.
Difunctional methacrylate monomers having a hemiacetal ester moiety in the molecule were used to prepare a plastic replica of an original mold for imprint lithography. UV curing of the monomers was performed with 365 nm light and photo-induced degradation of the cured resins was performed using 254 nm light.
Author HIRAI, Yoshihiko
MATSUKAWA, Daisaku
MITSUKURA, Kazuyuki
OKAMURA, Haruyuki
SHIRAI, Masamitsu
WAKAYAMA, Hiroyuki
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  givenname: Hiroyuki
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  fullname: WAKAYAMA, Hiroyuki
  organization: Department of Applied Chemistry, Osaka Prefecture University, 1-1 Gakuen-cho, Nakaku, Sakai, Osaka 599-8531, Japan
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  givenname: Kazuyuki
  surname: MITSUKURA
  fullname: MITSUKURA, Kazuyuki
  organization: Department of Applied Chemistry, Osaka Prefecture University, 1-1 Gakuen-cho, Nakaku, Sakai, Osaka 599-8531, Japan
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  givenname: Haruyuki
  surname: OKAMURA
  fullname: OKAMURA, Haruyuki
  organization: Department of Applied Chemistry, Osaka Prefecture University, 1-1 Gakuen-cho, Nakaku, Sakai, Osaka 599-8531, Japan
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  givenname: Yoshihiko
  surname: HIRAI
  fullname: HIRAI, Yoshihiko
  organization: Department of Physics and Electronics, Osaka Prefecture University, 1-1 Gakuen-cho, Nakaku, Sakai, Osaka 599-8531, Japan
– sequence: 6
  givenname: Masamitsu
  surname: SHIRAI
  fullname: SHIRAI, Masamitsu
  organization: Department of Applied Chemistry, Osaka Prefecture University, 1-1 Gakuen-cho, Nakaku, Sakai, Osaka 599-8531, Japan
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Keywords Ester
Microelectronic fabrication
Ultraviolet radiation
Lithography
Curing
Photoinduced effect
Monomer
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Snippet Difunctional methacrylate monomers haying a hemiacetal ester moiety in the molecule were used to prepare a plastic replica of an original mold for imprint...
Difunctional methacrylate monomers having a hemiacetal ester moiety in the molecule were used to prepare a plastic replica of an original mold for imprint...
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SubjectTerms Applied sciences
Electronics
Exact sciences and technology
Materials
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Title A UV curable resin with reworkable properties: application to imprint lithography
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