A UV curable resin with reworkable properties: application to imprint lithography

Difunctional methacrylate monomers haying a hemiacetal ester moiety in the molecule were used to prepare a plastic replica of an original mold for imprint lithography. UV curing of the monomers was performed with 365 nm light and photo-induced degradation of the cured resins was performed using 254...

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Bibliographic Details
Published inJournal of materials chemistry Vol. 19; no. 24; pp. 4085 - 4087
Main Authors MATSUKAWA, Daisaku, WAKAYAMA, Hiroyuki, MITSUKURA, Kazuyuki, OKAMURA, Haruyuki, HIRAI, Yoshihiko, SHIRAI, Masamitsu
Format Journal Article
LanguageEnglish
Published Cambridge Royal Society of Chemistry 01.01.2009
Subjects
Applied sciences
Electronics
Exact sciences and technology
Materials
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Ester
Microelectronic fabrication
Ultraviolet radiation
Lithography
Curing
Photoinduced effect
Monomer
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Summary:Difunctional methacrylate monomers haying a hemiacetal ester moiety in the molecule were used to prepare a plastic replica of an original mold for imprint lithography. UV curing of the monomers was performed with 365 nm light and photo-induced degradation of the cured resins was performed using 254 nm light.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0959-9428
1364-5501
DOI:10.1039/b905188k