Successive layer-by-layer deposition of metal (Mo, Ag)/BN/MoS2 nanolaminate films and the electric properties of BN/MoS2 heterostructure on different metal substrates

• Published in: Journal of materials science. Materials in electronics Vol. 31; no. 12; pp. 9559 - 9567
• Main Authors: Xiong, Fen, Jiang, Siyu, Wu, Jun, Guo, Caisheng, Zhu, Bailin, Geng, Renjie, Gan, Zhanghua, Yao, Yagang
• Format: Journal Article
• Language: English
• Published: New York Springer US 01.06.2020; Springer Nature B.V
• Subjects: Characterization and Evaluation of Materials; Chemistry and Materials Science; Deposition; Electric properties; Electrical resistivity; Electrode materials; Electrodes; Electronic devices; Heterostructures; Low temperature; Magnetron sputtering; Materials Science; Molybdenum disulfide; Morphology; Optical and Electronic Materials; Photovoltaic cells; Room temperature; Silver; Substrates

In this work, the M/MoS 2 and M/BN/MoS 2 (M = Ag or Mo) nanolaminate films were prepared by RF magnetron sputtering via successive layer-by-layer deposition at room temperature, followed by annealing at 500 °C. And then, the BN/MoS 2 heterostructure with clean and tight interface were successfully p...