HIPIMS: The New PVD Technology
HIPIMS (high power impulse magnetron sputtering) represents the most recent development in the field of PVD pulse sputtering technology. Utilizing extreme high pulse power densities (4‐6MW) discharge conditions are created similar to the well‐known cathodic arc discharge, yet completely avoiding the...
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| Published in | Vakuum in Forschung und Praxis : Zeitschrift für Vakuumtechnologie, Oberflèachen und Dünne Schichten Vol. 20; no. S1; pp. 27 - 32 |
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| Main Author | |
| Format | Journal Article |
| Language | English |
| Published |
Weinheim
WILEY-VCH Verlag
01.04.2008
WILEY‐VCH Verlag |
| Online Access | Get full text |
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| Summary: | HIPIMS (high power impulse magnetron sputtering) represents the most recent development in the field of PVD pulse sputtering technology. Utilizing extreme high pulse power densities (4‐6MW) discharge conditions are created similar to the well‐known cathodic arc discharge, yet completely avoiding the appearance of droplets. High metal ion concentrations and multiple ionization result in particularly dense, homogenous coatings with excellent adhesion to the substrate. Broad industrial realization is still in embryonic state. However, the first HIPIMS dedicated coating equipment is available commercially. Initial results on CrN coatings exhibiting hardness values up to HV3000 indicate the high potential of this new technology. |
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| Bibliography: | ark:/67375/WNG-0WLVNXNZ-Q istex:47492F85EDA096DD4C83D28D471D691ACC980598 ArticleID:VIPR200890036 ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
| ISSN: | 0947-076X 1522-2454 |
| DOI: | 10.1002/vipr.200890036 |