The cavity ring-down spectroscopy of C2 in a microwave plasma

• Published in: Diamond and related materials Vol. 11; no. 3-6; pp. 608 - 611
• Main Authors: John, P., Rabeau, J.R., Wilson, J.I.B.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier B.V 01.03.2002; Elsevier
• Subjects: Chemical vapor deposition; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Cross-disciplinary physics: materials science; rheology; Diamond films; Exact sciences and technology; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Physics; Physics of gases, plasmas and electric discharges; Physics of plasmas and electric discharges; Plasma; Plasma applications; Spectroscopy; Plasma; Spectroscopy; Chemical vapor deposition; Diamond films; Optical spectrometry; Emission spectroscopy; Films; Synthetic mineral; Diamonds; Optical transition; Carbon Molecules; Experimental study; Plasma chemistry; CVD; Plasma diagnostics; Nonmetals; Laser spectroscopy; PECVD; Microwave discharge
• ISSN: 0925-9635; 1879-0062
• DOI: 10.1016/S0925-9635(01)00653-7

The formation of C2 in an argon/hydrogen/methane 2.45 GHz microwave plasma has been studied by cavity ring-down spectroscopy and optical emission spectroscopy by observing the d 3Πg–a 3Πu optical transition in absorption and emission, respectively. The two states are shown to be in equilibrium under the plasma conditions adopted for this study. The plasma parameters are similar to those adopted for the growth of nanocrystalline diamond.