Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP)
[Display omitted] ► Cu-cotton fabrics were functionalized by bipolar asymmetric DC-pulse magnetron sputtering (DCP). The DCP of Cu-particles on cotton proceeds at a higher energy than DC-magnetron sputtering (DC) showing effects on the structure of the Cu-film on the textile. ► By transmission elect...
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Published in | Journal of photochemistry and photobiology. A, Chemistry. Vol. 220; no. 1; pp. 70 - 76 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
30.04.2011
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Subjects | |
Online Access | Get full text |
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Summary: | [Display omitted]
► Cu-cotton fabrics were functionalized by bipolar asymmetric DC-pulse magnetron sputtering (DCP). The DCP of Cu-particles on cotton proceeds at a higher energy than DC-magnetron sputtering (DC) showing effects on the structure of the Cu-film on the textile. ► By transmission electron spectroscopy (TEM), Cu-particles 35–50
nm in size were found and became more compact on the cotton surface as a function of deposition time. ► The oxidation of the
E. coli on the Cu-cotton surface was a function of reaction time and was monitored by the oxidation index of the carbon species on the fabric according to the ratio: (C–OH)/(C–C, C
C, C–H). ► Modification of the cotton by Cu-deposition changes the surface from hydrophilic to increasingly hydrophobic. The Cu-loaded cotton deposited shields the UV-light and becomes an effective antimicrobial agent.
Cu-cotton fabrics were functionalized by bipolar asymmetric DC-pulse magnetron sputtering (DCP). The DCP of Cu-particles on cotton proceeds at a higher energy than DC-magnetron sputtering (DC). The different sputtering mode showed effects on the structure of the Cu-film on the textile. The Cu-layer thickness was observed to be a function of DCP time being the rate of atomic deposition of 2.5
×
10
15
atoms/cm
2
s at 300
mA. The fastest
Escherichia coli inactivation was observed within 10
min when Cu was sputtered on cotton Cu for 60
s. This led to a film thickness of 30
nm (150 Cu-layers) with 1.7
×
10
17
atoms/cm
2. The Cu-textiles became darker at longer sputtering times as detected by diffuse reflectance spectroscopy (DRS). By transmission electron spectroscopy (TEM), Cu-particles 35–50
nm in size were found and became more compact on the cotton surface as a function of deposition time. X-ray photoelectron spectroscopy (XPS) was used to determine the surface atomic concentration of O, Cu C, and N along the states of oxidation of the Cu-ions during the redox process leading to
E. coli inactivation. The oxidation of the
E. coli on the Cu-cotton surface was a function of reaction time and was monitored by the oxidation index of the carbon species on the fabric according to the ratio: (C–OH)/(C–C, C
C, C–H). The increase in hydrophobicity of the Cu-cotton was followed as a function of the contact angle and droplet residence time for different samples. The results obtained for the
E. coli inactivation on the Cu-films are discussed suggesting a possible reaction mechanism. |
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ISSN: | 1010-6030 1873-2666 |
DOI: | 10.1016/j.jphotochem.2011.03.022 |