Synthesis of bismuth sulfide nanobelts for high performance broadband photodetectors
Broadband photodetectors are critical to modern industrial systems and scientific applications and have attracted broad attention in recent years. In this paper, high quality single-crystal Bi 2 S 3 nanobelts were prepared by using the chemical vapor deposition (CVD) method. The Bi 2 S 3 nanobelts w...
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Published in | Journal of materials chemistry. C, Materials for optical and electronic devices Vol. 8; no. 6; pp. 212 - 218 |
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Main Authors | , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Cambridge
Royal Society of Chemistry
14.02.2020
|
Subjects | |
Online Access | Get full text |
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Summary: | Broadband photodetectors are critical to modern industrial systems and scientific applications and have attracted broad attention in recent years. In this paper, high quality single-crystal Bi
2
S
3
nanobelts were prepared by using the chemical vapor deposition (CVD) method. The Bi
2
S
3
nanobelts were further used as photosensitive materials for broadband photo-detection. The as-grown Bi
2
S
3
nanobelts exhibit ultrahigh absorption coefficiency in the ultraviolet (UV) to near infrared (NIR) range. The photodetectors based on a single Bi
2
S
3
nanobelt showed excellent broadband photoresponse performance in the UV to NIR range (from 300 to 1000 nm), including high photoresponsivity up to 201 A W
−1
, an ultrafast response speed of ∼50 μs, a high external quantum efficiency of 31 140% and a high detectivity of 2.7 × 10
10
Jones. The superior performance can be attributed to the ultrahigh absorption coefficiency of Bi
2
S
3
nanobelts, as well as the Schottky contact between the Bi
2
S
3
nanobelt and the Au electrode. The present work suggests that the single-crystal Bi
2
S
3
nanobelts possess great potential for the fabrication of high performance broadband photodetectors.
We fabricated a superior broadband photodetector based on single crystal Bi
2
S
3
nanobelts with a high sensitivity to UV-near infrared light. |
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Bibliography: | 10.1039/c9tc06780a Electronic supplementary information (ESI) available. See DOI |
ISSN: | 2050-7526 2050-7534 |
DOI: | 10.1039/c9tc06780a |