Synthesis of constrained bicycloalkanes through bibase-promoted brook rearrangement/radical-polar crossover cyclization

Highly constrained bicyclic scaffolds are ubiquitous and attracting increasing interest in pharmaceutical and biotechnology discoveries owing to the enhanced activities. Herein, we report a protocol to access highly substituted constrained bicycloalkanes from readily accessible α-silyl alcohols and...

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Published inChemical science (Cambridge) Vol. 15; no. 28; pp. 1192 - 1198
Main Authors Ouyang, Xinke, Shi, Bingyao, Zhao, Yuanyuan, Zhu, Zhimin, Li, Ziyang, Yang, Yuxin, Shu, Chao
Format Journal Article
LanguageEnglish
Published CAMBRIDGE Royal Soc Chemistry 17.07.2024
Royal Society of Chemistry
The Royal Society of Chemistry
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Summary:Highly constrained bicyclic scaffolds are ubiquitous and attracting increasing interest in pharmaceutical and biotechnology discoveries owing to the enhanced activities. Herein, we report a protocol to access highly substituted constrained bicycloalkanes from readily accessible α-silyl alcohols and olefins through a bibase-promoted Brook rearrangement/radical-polar crossover cyclization (RPCC) process. Of note, the practical procedure features broad substrate scope and good group tolerance under mild and operationally simple conditions, using an inexpensive organic photocatalyst. Gram-scale preparation and diverse synthetic transformations demonstrate opportunities to rapidly construct molecular complexity. Mechanistic studies have indicated that the transformation involves a bibase-promoted radical transfer rearrangement addition/radical-polar crossover cyclization relay sequence, which differs from traditional solitary RPCC reactions. A concise protocol for the synthesis of constrained bicycloalkanes has been developed, using easily obtainable α-silyl alcohols and alkenes through a bibase-promoted brook rearrangement/radical-polar crossover cyclization (RPCC) process.
Bibliography:Electronic supplementary information (ESI) available. See DOI
https://doi.org/10.1039/d4sc02532f
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ISSN:2041-6520
2041-6539
DOI:10.1039/d4sc02532f