Purification by SPS and formation of a unique 3D nanoscale network: the showcase of Ni-Cr-S
The occurrence of a unique 3D nanoscale network in Ni-Cr-S, treated via spark-plasma sintering, was discovered with a variety of ex situ and in situ TEM and XRD techniques. The starting material, consisting of a heterogeneous mixture of different phases, could be purified upon application of the sin...
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Published in | Journal of materials chemistry. C, Materials for optical and electronic devices Vol. 7; no. 48; pp. 15188 - 15196 |
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Main Authors | , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Cambridge
Royal Society of Chemistry
2019
|
Subjects | |
Online Access | Get full text |
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Summary: | The occurrence of a unique 3D nanoscale network in Ni-Cr-S, treated
via
spark-plasma sintering, was discovered with a variety of
ex situ
and
in situ
TEM and XRD techniques. The starting material, consisting of a heterogeneous mixture of different phases, could be purified upon application of the sintering process. The obtained samples showed a network of chemically segregated domains being either Ni rich and Cr deficient or
vice versa
. These domains could be proven to intergrow fully coherently in 3D, thus establishing a unique microstructure. Electron beam irradiation caused the initial Cr
3
S
4
-type structures to transform into the disordered NiAs-type. The disordering is characterised by significant short-range ordering as indicated by the appearance of prominent diffuse scattering. Thermoelectric characterisation at room temperature indicated an n-type semiconductor behaviour with thermal and electrical conductivities similar to usual thermoelectric materials, however with a low Seebeck coefficient and a low power factor of 49.3 μW m
−1
K
−2
.
The occurrence of a unique 3D nanoscale network in Ni-Cr-S, treated
via
spark-plasma sintering, was discovered with a variety of
ex situ
and
in situ
TEM and XRD techniques. |
---|---|
Bibliography: | 10.1039/c9tc04548a Electronic supplementary information (ESI) available. See DOI ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 14 |
ISSN: | 2050-7526 2050-7534 |
DOI: | 10.1039/c9tc04548a |