Dislocation–interface interaction in nanoscale fcc metallic bilayers

Dislocation–interface interactions are investigated in a Ni–Cu bilayer using molecular mechanics simulations. Nanoindentation model is used to generate dislocations in the top Ni layer and study their propagation through coherent (1 1 1) fcc interface into Cu. Although dislocations do propagate thro...

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Bibliographic Details
Published inMechanics research communications Vol. 37; no. 3; pp. 315 - 319
Main Authors Shao, Shuai, Medyanik, Sergey N.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 01.04.2010
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Summary:Dislocation–interface interactions are investigated in a Ni–Cu bilayer using molecular mechanics simulations. Nanoindentation model is used to generate dislocations in the top Ni layer and study their propagation through coherent (1 1 1) fcc interface into Cu. Although dislocations do propagate through, the interface acts as a strong barrier to gliding dislocations and contributes considerably to the overall strain hardening of the nanolayered material. Mechanisms of dislocation–interface interactions are analyzed. In particular, spreading of a dissociated dislocation core at the interface and interfacial stacking fault formation are investigated along with their effect on the material strengthening.
ISSN:0093-6413
1873-3972
DOI:10.1016/j.mechrescom.2010.03.007