Extreme Ultraviolet Spectroscopy of a Laser Plasma Source for Lithography

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Bibliographic Details
Published inPhysica scripta Vol. 57; no. 2; pp. 276 - 282
Main Authors Shevelko, A P, Shmaenok, L A, Churilov, S S, Bastiaensen, R K F J, Bijkerk, F
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.02.1998
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ISSN:1402-4896
0031-8949
1402-4896
DOI:10.1088/0031-8949/57/2/023