Influence of Nitrogen on the Microstructure, Hardness, and Tribological Properties of Cr–Ni–B–C–N Films Deposited by DC Magnetron Sputtering
Using the direct current reaction magnetron sputtering technique, Cr–Ni–B–C–N films are deposited onto silicon substrates by sputtering Cr–Ni and B–C targets in an Ar/N 2 gas mixture. The microstructure, chemical bonds, hardness, and tribological properties of the films are characterized using the X...
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Published in | Journal of superhard materials Vol. 42; no. 2; pp. 68 - 77 |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
Moscow
Pleiades Publishing
01.03.2020
Springer Nature B.V |
Subjects | |
Online Access | Get full text |
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Summary: | Using the direct current reaction magnetron sputtering technique, Cr–Ni–B–C–N films are deposited onto silicon substrates by sputtering Cr–Ni and B–C targets in an Ar/N
2
gas mixture. The microstructure, chemical bonds, hardness, and tribological properties of the films are characterized using the X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) methods, and microindentation and tribological tests. The experimental results show that the microstructure and properties of the films change upon incorporation of nitrogen into the film composition. The Cr–Ni–B–C–N films are mainly composed of the nanocrystalline CrN phase with some fractions of the Ni, Cr
2
O
3
, and B
2
O
3
crystalline phases embedded in a mixed amorphous environment. Addition of nitrogen gives rise to an increase in the film hardness to a maximum value of about 17 GPa at
F
N2
= 40 cm
3
/min, and then the hardness sharply decrease with a further increase in the
F
N2
flow rate. The incorporation of nitrogen into the structure of films improves their tribological and adhesion properties. |
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ISSN: | 1063-4576 1934-9408 |
DOI: | 10.3103/S1063457620020069 |