InAs0.3Sb0.7 films grown on (100) GaSb substrates with a buffer layer by liquid-phase epitaxy

The growth of InAsxSb1-x films on (100) GaSb substrates by liquid-phase epitaxy (LPE) has been investigated and epitaxial InAs0.3Sb0.7 films with InAs0.91Sb0.09 buffer layers have been successfully obtained. The low X-ray rocking curve FHWM values of InAs0.3Sb0.7 layer shows the high quality of crys...

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Published inJournal of crystal growth Vol. 304; no. 2; pp. 472 - 475
Main Authors FUBAO GAO, NUOFU CHEN, LEI LIU, ZHANG, X. W, JINLIANG WU, ZHIGANG YIN
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier 15.06.2007
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Summary:The growth of InAsxSb1-x films on (100) GaSb substrates by liquid-phase epitaxy (LPE) has been investigated and epitaxial InAs0.3Sb0.7 films with InAs0.91Sb0.09 buffer layers have been successfully obtained. The low X-ray rocking curve FHWM values of InAs0.3Sb0.7 layer shows the high quality of crystal-orientation structure. Hall measurements show that the highest electron mobility in the samples obtained is 2.9X104cm2V-1s-1 and the carrier density is 2.78X1016cm-3 at room temperature (RT). The InAs0.3Sb0.7 films grown on (100) GaSb substrates exhibit excellent optical performance with a cut-off wavelength of 12mum.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2007.03.011