Study of the plasma parameters in a high-current pulsed magnetron sputtering system

• Published in: Plasma physics reports Vol. 37; no. 3; pp. 239 - 243
• Main Authors: Odivanova, A. N., Podkovyrov, V. G., Sochugov, N. S., Oskomov, K. V.
• Format: Journal Article
• Language: English
• Published: Dordrecht SP MAIK Nauka/Interperiodica 01.03.2011
• Subjects: Atomic; CATHODES; CHARGED-PARTICLE TRANSPORT; CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; Diagnostics of Pulsed Systems; ELECTRIC CONDUCTIVITY; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; EMISSION SPECTROSCOPY; IONIZATION; MAGNETRONS; Molecular; Optical and Plasma Physics; Physics; Physics and Astronomy; PLASMA; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA PRODUCTION; SPUTTERING; VELOCITY; Plasma Physic Report; Cathode Sheath; Magnetron Discharge; Cathode Spot; Cathode Material
• ISSN: 1063-780X; 1562-6938
• DOI: 10.1134/S1063780X1101003X

Results are presented from experimental studies of the current-voltage characteristics and spatial and temporal parameters of the plasma in a high-current pulsed magnetron sputtering system with a 10-cm-diameter plane disk cathode. It is shown that the plasma density in such a system is three orders of magnitude higher than that in conventional dc magnetron discharges and reaches 10 13 cm −3 at a distance of 250 mm from the cathode at a peak discharge current of 500 A. The plasma propagates from the cathode region at a velocity of 1 cm/μs in the axial direction and 0.25 cm/μs in the radial direction. Optical emission spectroscopy shows that the degree of plasma ionization increases severalfold with increasing discharge current, mainly at the expense of the sputtered material.