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Oxygen plasma exposure effects on indium oxide nanowire transistors

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Bibliographic Details
Published inNanotechnology Vol. 21; no. 14; p. 145207
Main Authors Kim, Seongmin, Delker, Collin, Chen, Pochiang, Zhou, Chongwu, Ju, Sanghyun, Janes, David B
Format Journal Article
LanguageEnglish
Published IOP Publishing 09.04.2010
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ISSN:0957-4484
1361-6528
DOI:10.1088/0957-4484/21/14/145207
  • ikona citování Cite this
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