Preparation of the oxyfluoride glass with high 3ω laser induced damage threshold

• Published in: Optics and laser technology Vol. 56; pp. 88 - 91
• Main Authors: Hou, Chaoqi, Wang, Pengfei, Li, Weinan, Guo, Haitao, Fu, Lili, Qiao, Zebang, Lu, Min, Wei, Wei, Peng, Bo
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01.03.2014
• Subjects: Laser damage; Materials; Optical materials; Optical materials; Laser damage; Materials
• ISSN: 0030-3992; 1879-2545
• DOI: 10.1016/j.optlastec.2013.06.015

An oxyfluoride glass with good thermal stability (ΔT=313.72°C), high transmittance and excellent 3ω laser induced damage threshold (LIDT) was prepared by a high temperature melting technique. The oxyfluoride glass has an optical transmittance as high as 91.2% (without AR coatings) at 351nm and the transmission is stable in the successive laser shots. Its 3ω LIDT is higher than that of fused silica, and the corresponding mechanism has been discussed through SEM microstructure and damage morphology observation. This novel oxyfluoride glass makes itself a promising candidate material used in 3ω high power laser system. •A novel oxyfluoride glass with good thermal stability and high transmittance was provided.•This glass exhibit excellent 3ω laser induced damage threshold (LIDT).•The corresponding damage mechanism has been discussed.•This novel oxyfluoride glass makes itself a promising candidate material used in 3ω high power laser system.