An Ion-Sputtering Gun to Clean Crystal Surfaces In-Situ in an Ultra-High-Vacuum Electron Microscope
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Published in | Japanese Journal of Applied Physics Vol. 19; no. 10; pp. 1981 - 1994 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
1980
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Online Access | Get full text |
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ISSN: | 0021-4922 1347-4065 |
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DOI: | 10.1143/JJAP.19.1981 |